PROPERTIES OF NANO AND MICRO P-TYPE Cu2S FILMS Page No: 3247-3257

HS Soliman, MM Saadeldin, K Sawaby and A Eldenglawey

Keywords: CuS alloys, structural and electrical properties, thin films, thermal evaporation, XRD, SEM, AFM

Abstract: Thermal evaporation technique under pressure 10-6 torr is used to prepare Cuprous Sulphide (Cu2S) with different thicknesses on glass substrates. Energy dispersive X-ray (EDX), X-ray diffraction, scanning electron microscope (SEM), and atomic force microscope (AFM) are used to characterize the chemical composition and the structure of Cu2S. The dark dc electrical resistivity (?) is measured using two point probe method at different temperatures (from 303 to 423 K). The thermoelectric power (Seeback coefficient) was investigated in temperature range (303 – 373 K)



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